Process Specifications Method of application: The diamond-chromium composite plating utilizes an electrochemical galvanic process. Diamond micro-particle size: Under 4x10 -5 in. (0.0004 to 0.0006 mm) Diamond micro-particle content: 0.05-0.50% of the mass content. Dia-Clust plating thickness range: 0.00004" - 0.002". Dia-Clust plating microhardness: Up to 1200 Knoop = 85+ Rc. Maximum operating temperature: -300 F to 1,600 F (870 C) Co-efficient of friction: lower than TiN, TiCN, or WC/C

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A Division of UK Abrasives, Inc.
3045 Mac Arthur Blvd.  /  Northbrook, Illinois 60062
Phone: 847.498.3710  /  Fax: 847.291.7670